도포 열분해법을 이용하여 MgO(100) 기판위에 제조한 $Pb(Zr, Ti)O_3$ 박막의 에피탁시와 표면 미세구조에 미치는 열처리 온도의 영향 |
이형민, 황규석, 김병훈, 진부고명1, Iwao Yamaguchi1, Toshiya Kumagai1, Susumu Mizuta1 |
전남대학교 공과대학 세라믹공학과 1일본 물질공학 공업기술 연구소 무기재료부 |
Effect of Annealing Temperature on Epitaxy and Surface morphology of $Pb(Zr, Ti)O_3$ Thin Films on MgO (100) Substrate by Dipping-Pyrolysis Process |
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ABSTRACT |
$Pb(Zr,Ti)O_3$ (Zr : Ti=0.52:0.48) thin films were fabricated bydipping-pyrolysis process on MgO(100) sub-strates with metal naphthenates used as staring materials. Effects of final heat-treatment temperatuer on epitaxy and surface morphology of the films were investigated. Highly oriented (00l)/(h00) films prefired at $200^{circ}C$ were obtained at final heat-treatment temperatures of $750~800^{circ}C$ and from the results of the X-ray diffraction pole-figure analysis these films had epitaxial relationship with substrates used. Film heat-trated at $750^{circ}C$ had a smooth surface and showed no distinct texture while the rosette-type microstructure caused by lead volatilization was observed in the film after heat -treatment at $800^{circ}C$ |
Key words:
$Pb(Zr, Ti)O_3$ thin films, Dipping-pyrolysis process, MgO(100), Metal naphthenates, Epitaxial relationship |
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