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Fabrication of Silicide-based Thermoelectric Nanocomposites: A Review
Gwansik Kim, Wonkyung Kim, Wooyoung Lee
J. Korean Ceram. Soc. 2019;56(5):435-442.   Published online September 23, 2019
DOI: https://doi.org/10.4191/kcers.2019.56.5.03
                                 Cited By 2
Effects of Ti and TiN Capping Layers on Cobalt-silicided MOS Device Characteristics in Embedded DRAM and Logic
Jong-Chae Kim, Yeong-Cheol Kim, Jun-Ho Choy
J. Korean Ceram. Soc. 2001;38(9):782
      
Silicidation and Thermal Stability of the So/refreactory Metal Bilayer on the Doped Polycrystalline Si Substrate
권영재, 이종무
J. Korean Ceram. Soc. 1999;36(6):604
      
Silicidation of Co/M/(100) Si bilayer Structures
권영재, 이종무, 배대록, 강호규
J. Korean Ceram. Soc. 1998;35(5):505
      
Synthesis and Sinteirng of $MoSi_2$ by SHS Process
이승재, 장윤식, 김인술, 박홍채, 오기동
J. Korean Ceram. Soc. 1995;32(9):1085
      
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