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Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings
Seon-A Choi, Seong-Won Kim, Sung-Min Lee, Hyung-Tae Kim, Yoon-Suk Oh
J. Korean Ceram. Soc. 2017;54(6):511-517.   Published online November 29, 2017
DOI: https://doi.org/10.4191/kcers.2017.54.6.05
                           Cited By 4
Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering
Kyoon Choi, Eui-Seok Choi, Jin-Ha Hwang, Soo-Hong Lee
J. Korean Ceram. Soc. 2007;44(10):585
DOI: https://doi.org/10.4191/kcers.2007.44.1.585
      
Microstructure and Magnetic Properties of Pulsed DC Magnetron Sputtered Zn0.8Co0.2O Film Deposited at Various Substrate Temperatures
Young-Hun Kang, Bong-Seok Kim, Weon-Pil Tai, Ki-Chul Kim, Su-Jeung Suh, Tae-Seok Park, Young-Sung Kim
J. Korean Ceram. Soc. 2006;43(2):79
DOI: https://doi.org/10.4191/kcers.2006.43.2.079
      
Microstructure and Magnetic Properties of Zn1-xCoxO Film Prepared by Pulsed DC Magnetron Sputtering
Yoon-Duk Ko, Seok-Bae Ko, Moon-Soon Choi, Weon-Pil Tai, Ki-Chul Kim, Jong-Min Kim, Su-Jeung Soh, Young-Sung Kim
J. Korean Ceram. Soc. 2005;42(3):211
DOI: https://doi.org/10.4191/kcers.2005.42.3.211
      
Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering
류현욱, 최광표, 노효섭, 박용주, 박진성
J. Korean Ceram. Soc. 2004;41(2):106
DOI: https://doi.org/10.4191/kcers.2004.41.2.106
         Cited By 1
Deposition Characteristic of InNx Films by Reactive DC Magnetron Sputtering
송풍근, 류봉기, 김광호
J. Korean Ceram. Soc. 2003;40(8):739
DOI: https://doi.org/10.4191/kcers.2003.40.8.739
      
Microstructure Control of Tungsten Film for Bragg Reflectors of Thin Film Bulk Acoustic Wave Resonators
강성철, 이시형, 박종완, 이전국
J. Korean Ceram. Soc. 2003;40(3):268
DOI: https://doi.org/10.4191/kcers.2003.40.3.268
         Cited By 1
Anode Characteristics of Tin Oxide Thin Films According to Various Si Additions for Lithium Secondary Microbattery
박건태, 박철호, 손영국
J. Korean Ceram. Soc. 2003;40(1):69
DOI: https://doi.org/10.4191/kcers.2003.40.1.069
      
Electrical Properties of Sputtered Gallium-doped Zinc Oxide Films Deposited Using Ne, Ar, or Kr Gas
Pung-Keun Song, Bong-Ki Ryu, Kwang-Ho Kim
J. Korean Ceram. Soc. 2002;39(10):935
DOI: https://doi.org/10.4191/kcers.2002.39.10.935
         Cited By 1
The Effect of Residual H2Pressure on Gallium-doped ZnO Films Deposited by Magnetron Sputtering
Pung-Keun Song, Young-Jun Kwon, Jae-Min Cha, Byung-Chul Lee, Bong-Ki Ryu, Kwang-Ho Kim
J. Korean Ceram. Soc. 2002;39(10):928
DOI: https://doi.org/10.4191/kcers.2002.39.10.928
         Cited By 1
The Fabrication of ITO Thin-film O3 Gas Sensors Using R.F. Magnetron Sputtering Method and their Characterization
Jung-Bum Kwon, Kyoung-Keun Jung, Dong-Su Lee, Jo-Woong Ha, Kwang-Soo Yoo
J. Korean Ceram. Soc. 2002;39(9):840
DOI: https://doi.org/10.4191/kcers.2002.39.9.840
         Cited By 3
Fabrication and Characterization of Sn1-xSixO2 Anode for Lithium Secondary Battery by R.F. Magnetron Sputtering Method
Sang-Heon Lee, Keun-Tae Park, Young-Guk Son
J. Korean Ceram. Soc. 2002;39(4):394
DOI: https://doi.org/10.4191/kcers.2002.39.4.394
         Cited By 1
Fabrication of Lithium Nickel Cobaltate Thin-film for the Cathode Material of Microbattery
Duksu Kim, Mun-Kyu Kim, Jong-Tae Son, Ho-Gi Kim
J. Korean Ceram. Soc. 2001;38(8):683
      
The growth of ${Ce_{1-x}}{RE_x}{O_{2-y}}$ Thin Films by RF Magnetron Sputtering
주성민, 김철진, 박병규
J. Korean Ceram. Soc. 2000;37(10):1014
      
Fabrication and Characterization of ${LiMn_2}{O_4}$ Cathode for Lithium Rechargeable Battery by R.F.Magnetron Sputtering
우태욱, 손영국
J. Korean Ceram. Soc. 2000;37(6):552
      
A Study on the Dielectric Properties of (BaBi$_{0.5}$Sr$_{0.5}$)TiO$_3$ Thin Films Diffused with PbO-Bi$_2$O$_3$-B$_2$O$_3$ Layer
김진철, 진병태, 박원모, 남산, 김명호, 변재동
J. Korean Ceram. Soc. 1998;35(9):895
      
Dielectric and Pyroelectric Properties of $Ba_{0.67}$Sr${0.33)2$TiO$_3$ Thin Plates and Films
이문희, 조성걸, 이상기
J. Korean Ceram. Soc. 1998;35(7):679
      
Microstructure and Electric Properties of Ferroelectric SrBi$_2$Ta$_2$O$_9$ Thin Films Deposited by Modified Rf Magnetron Sputtering Technique
양철훈, 윤순길
J. Korean Ceram. Soc. 1998;35(5):472
      
Characterization of Ferroelectric $SrBi_2Ta_2O_9$ Thin Films Deposited by RF Magnetron Sputtering With Various Annealing Temperatures
박상식, 양철훈, 윤순길, 안준형, 김호기
J. Korean Ceram. Soc. 1997;34(2):202
Study on Properties of Antimony-doped Tin Oxide Thin Films Prepared by Sputtering
김층완, 김광호, 이환수, 이혜용
J. Korean Ceram. Soc. 1996;33(7):735
      
Preparation of ATO Thin Films by DC Magnetron Sputtering (II)Electrical Properties
윤천, 이혜용, 정윤중, 이경희
J. Korean Ceram. Soc. 1996;33(5):514
      
Preparation of ATO Thin Films by DC Magnetron Sputtering (I) Deposition Characteristics
윤천, 이혜용, 정윤중
J. Korean Ceram. Soc. 1996;33(4):441
      
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