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J. Korean Ceram. Soc. > Volume 40(3); 2003 > Article
Journal of the Korean Ceramic Society 2003;40(3): 268.
doi: https://doi.org/10.4191/kcers.2003.40.3.268
체적탄성파 공진기 브라그 반사층 적용을 위한 텅스텐 박막의 미세구조 조절에 대한 연구
강성철, 이시형1, 박종완2, 이전국1
한국과학기술연구원 박막재료연구센터, 한양대학교 재료공학과
1한국과학기술연구원 박막재료연구센터
2한양대학교 재료공학과
Microstructure Control of Tungsten Film for Bragg Reflectors of Thin Film Bulk Acoustic Wave Resonators
ABSTRACT
The microstructures of tungsten films were controlled by changing the sputtering pressure and substrate temperatures during D.C. sputter deposition. As the sputtering pressures were decreased, the sputtered models of the tungsten films were changed from the zone I model to zone T model. The tungsten film having zone T model microstructure shows a resistivity of 10${times}$10$^$-6/ $Omega$-cm and (110) preferred orientation. FBAR with Bragg reflector composed of $SiO_2$and tungsten films having zone T model microstructure shows quality factor, Q$_$s/, of 494 and K$_$eff/$^$2/ of 5.5% due to the high acoustic impedance and the smooth surface.
Key words: Tungsten, Microstructure, FBAR, Resonator, Resistivity, D.C, magnetron sputtering
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