| FHD법에 의해 증착된 실리카막의 도펀트 첨가에 의한 굴절률 제어 |
| 김용탁, 서용곤1, 윤형도1, 임영민1, 윤대호 |
성균관대학교 신소재공학과
1전자부품연구원 광부품연구센터 |
| Refractive Index Control by Dopant for Thick Silica films Deposited by FHD |
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| ABSTRACT |
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Silica based Planar Lightwave Circuits (PLC) have been applied to various kinds of wave-guided optical passive devices. SiO$_2$ (buffer) and GeO$_2$-SiO$_2$ (core) thick films have been deposited by Flame Hydrolysis Deposition (FHD). The SiO$_2$ films were produced by the flame hydrolysis reaction of halide materials such as SiCl$_4$, POCl$_3$ and BCl$_3$ into an oxy-hydrogen torch. The P concentration increased from 2.0 to 2.8 at％ on increasing the POCl$_3$/BCl$_3$ flow ratio. The refractive index increased from 1.4584 to 1.4605 on increasing the POC1$_3$/BC1$_3$ flow ratio from 0.6 to 2.6. The refractive index of GeO$_2$-SiO$_2$ films was controlled by the GeCl$_4$ flow rate. The refractive index increased from 1.4615 to 1.4809 on increasing the GeCl$_4$ flow rate from 30 to 120 sccm. |
| Key words:
Flame hydrolysis deposition, Consolidation, Silica, PLC |
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