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No Tilt Angle Dependence of Grain Boundary on Mechanical Strength of Chemically Deposited Graphene Film

Jong Hun Kim, Sung Joo An, Jong-Young Lee, Eunji Ji, James Hone, Gwan-Hyoung Lee

J. Korean Ceram. Soc. 2019;56(5):506-512. Published online September 24, 2019
DOI: https://doi.org/10.4191/kcers.2019.56.5.11

Cited By 1

Optimization of the Material and Structure of Component Parts for Reducing the Number of Impurity Particles in CVD Process

Won Kyung Kim, Ram Woo, Jong Wook Roh

J. Korean Ceram. Soc. 2019;56(3):277-283. Published online May 23, 2019
DOI: https://doi.org/10.4191/kcers.2019.56.3.03

Hot Filament Chemical Vapor Deposition of Crystalline Boron Films

Gerardo Soto

J. Korean Ceram. Soc. 2019;56(3):269-276. Published online May 23, 2019
DOI: https://doi.org/10.4191/kcers.2019.56.3.04

Cited By 3

Properties of the Natural and CVD Synthetic Diamonds for Identification

Yunwoo Kim, Jeongho Song, Yunyoung Noh, Ohsung Song

J. Korean Ceram. Soc. 2014;51(4):350
DOI: https://doi.org/10.4191/kcers.2014.51.4.350

Cited By 1

The Photocatalytic Reaction of the Thin Film TiO₂-Sr₄Al₁₄O₂₅ Phosphors for Benzene Gas

Seung-Woo Kim, Jung-Sik Kim

J. Korean Ceram. Soc. 2013;50(1):50
DOI: https://doi.org/10.4191/kcers.2013.50.1.50

Deposition of β-SiC by a LPCVD Method and the Effect of the Crystallographic Orientation on Mechanical Properties

Daejong Kim, Jongmin Lee, Weon-Ju Kim, Soon Gil Yoon, Ji Yeon Park

J. Korean Ceram. Soc. 2013;50(1):43
DOI: https://doi.org/10.4191/kcers.2013.50.1.43

Cited By 2

Application of 3-dimensional phase-diagram using FactSage in C₃H₈-SiCl₄-H₂ System

Jun-Woo Kim, Hyung-Tae Kim, Kyung-Ja Kim, Jong-Heun Lee, Kyoon Choi

J. Korean Ceram. Soc. 2011;48(6):621
DOI: https://doi.org/10.4191/kcers.2011.48.6.621

Cited By 3

Thermodynamic Prediction of SiC Deposition in C₃H₈-SiCl₄-H₂ System

Jun-Woo Kim, Seong-Min Jeong, Hyung-Tae Kim, Kyung-Ja Kim, Jong-Heun Lee, Kyoon Choi

J. Korean Ceram. Soc. 2011;48(3):236
DOI: https://doi.org/10.4191/kcers.2011.48.3.236

Cited By 1

Electrical Characteristics of Al₂O₃/TaAlO₄/SiO₂ Multi-layer Films by Different Tunnel Oxide Thicknesses and Annealing Treatment

Jung-Tae Park, Hyo-June Kim, Doo-Jin Choi

J. Korean Ceram. Soc. 2010;47(5):461
DOI: https://doi.org/10.4191/kcers.2010.47.5.461

The Properties and Uniformity Change of Amorphous SiC:H Film Deposited using Remote PECVD System with Various Deposition Conditions

Sung-Hyuk Cho, Yoo-Youl Choi, Doo-Jin Choi

J. Korean Ceram. Soc. 2010;47(3):262
DOI: https://doi.org/10.4191/kcers.2010.47.3.262

Cited By 1

Characterization of Tribological Properties of DLC Films Prepared by Different Deposition Method

Yoon-Suk Oh

J. Korean Ceram. Soc. 2009;46(5):497
DOI: https://doi.org/10.4191/kcers.2009.46.5.497

Microstructure and Hardness Changes of the CVD-ZrC Film with Different Deposition Temperature

Jong-Hoon Park, Choong-Hwan Jung, Weon-Ju Kim, Do-Jin Kim, Ji-Yeon Park

J. Korean Ceram. Soc. 2008;45(9):567
DOI: https://doi.org/10.4191/kcers.2008.45.9.567

Cited By 4

Residence Time Effect on the Growth of ZrC by Low Pressure Chemical Vapor Deposition

Jong-Hoon Park, Choong-Hwan Jung, Do-Jin Kim, Ji-Yeon Park

J. Korean Ceram. Soc. 2008;45(5):280
DOI: https://doi.org/10.4191/kcers.2008.45.5.280

Properties of Chemical Vapor Deposited ZrC coating layer for TRISO Coated Fuel Particle

Jun-Gyu Kim, E-Sul Kum, Doo-Jin Choi, Young-Woo Lee, Ji-Yeon Park

J. Korean Ceram. Soc. 2007;44(10):580
DOI: https://doi.org/10.4191/kcers.2007.44.1.580

A Study on the CVD Deposition for SiC-TRISO Coated Fuel Material Fabrication

Jun-Gyu Kim, E-Sul Kum, Doo-Jin Choi, Sung-Soon Kim, Hong-Lim Lee, Young-Woo Lee, Ji-Yeon Park

J. Korean Ceram. Soc. 2007;44(3):169
DOI: https://doi.org/10.4191/kcers.2007.44.3.169

Cited By 1

Effects of Thermal Heat Treatment Process on the Ferroelectric Properties of ReMnO₃ (Re:Ho, Er) Thin Films

Eung Soo Kim, Jung-Hoon Chae

J. Korean Ceram. Soc. 2005;42(11):763
DOI: https://doi.org/10.4191/kcers.2005.42.11.763

Fabrication of Nd-Substituted Bi₄Ti₃O₁₂ Thin Films by Metal Organic Chemical Vapor Deposition and Their Ferroelectrical Characterization

Hyoeng-Ki Kim, Dong-Kyun Kang, Byong-Ho Kim

J. Korean Ceram. Soc. 2005;42(4):219
DOI: https://doi.org/10.4191/kcers.2005.42.4.219

Low Index Contrast Planar SiON Waveguides Deposited by PECVD

Yong-Tak Kim, Seok-Gyu Yoon, Dae-Ho Yoon

J. Korean Ceram. Soc. 2005;42(3):178
DOI: https://doi.org/10.4191/kcers.2005.42.3.178

Cited By 1

Nucleation Enhancing Effect of Different ECR Plasmas Pretreatment in the RUO₂ Film Growth by MOCVD

Taejong Eom, Yunkyu Park, Chongmu Lee

J. Korean Ceram. Soc. 2005;42(2):94
DOI: https://doi.org/10.4191/kcers.2005.42.2.094

Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD

Hyun-Ah Park, Jong-Min Lim, Chong-Mu Lee

J. Korean Ceram. Soc. 2004;41(6):435
DOI: https://doi.org/10.4191/kcers.2004.41.6.435

Growth of Carbon Nanotubes on Different Catalytic Substrates

배성규, 이세종, 조성진, 이득용

J. Korean Ceram. Soc. 2004;41(3):247
DOI: https://doi.org/10.4191/kcers.2004.41.3.247

Cited By 4

SiON/SiO₂ Multilayer Deposited by PECVD for Low-Loss Waveguides

김용탁, 김동신, 윤대호

J. Korean Ceram. Soc. 2004;41(3):197
DOI: https://doi.org/10.4191/kcers.2004.41.3.197

A Study on fabrication of Ferroelectric SBT Thin Films by Liquid Delivery MOCVD Process

강동균, 백승규, 송석표, 김병호

J. Korean Ceram. Soc. 2003;40(1):46
DOI: https://doi.org/10.4191/kcers.2003.40.1.046

Cited By 1

Electrical Properties of ReMnO₃(Re:Y, Ho, Er) Thin Film Prepared by MOCVD Method

Eung Soo Kim, Jung-Hoon Chae, Seung-Gu Kang

J. Korean Ceram. Soc. 2002;39(12):1128
DOI: https://doi.org/10.4191/kcers.2002.39.12.1128

Refractive Index Control of Silicon Oxynitride Thick Films on Core Layer of Silica Optical Waveguide

김용탁, 조성민, 윤석규, 서용곤, 임영민, 윤대호

J. Korean Ceram. Soc. 2002;39(6):594
DOI: https://doi.org/10.4191/kcers.2002.39.6.594

Optical Properties and Structural Analysis of SiO₂ Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition

Sung-Min Cho, Yong-Tak Kim, Yong-Gon Seo, Hyung-Do Yoon, Young-Min Im, Dae-Ho Yoon

J. Korean Ceram. Soc. 2002;39(5):479
DOI: https://doi.org/10.4191/kcers.2002.39.5.479

Cited By 1

The Effect of RF Power and $SiH_4$/($N_2$O+$N_2$) Ratio in Properties of SiON Thick Film for Silica Optical Waveguide

김용탁, 조성민, 서용곤, 임영민, 윤대호

J. Korean Ceram. Soc. 2001;38(12):1150

Effects of $N_2O$/$SiH_4$Flow Ratio and RF Power on Properties of $SiO_2$Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition

조성민, 김용탁, 서용곤, 임영민, 윤대호

J. Korean Ceram. Soc. 2001;38(11):1037

Preparation of AlN Thin Film with New Type of Single Precursor

최승철, 안창규, 한성환

J. Korean Ceram. Soc. 2001;38(8):761

Deposition of 3C-SiC Films by Plasma-enhanced Chemical Vapor Deposition (I): Deposition Behaviors of SiC with Deposition Parameters

김광호, 서지윤, 윤석영

J. Korean Ceram. Soc. 2001;38(6):531

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