| Surface analysis of yttrium oxyfluoride deposited via air plasma spraying for Erosion resistance against NF3 plasma |
| R. Kreethi1, Yu-Jin Hwang1, Ho-Young Lee 2, Jae-Hyuk Park 3, Kee-Ahn Lee1 |
1Department of Materials Science and Engineering, Inha University, Incheon, 22212, Republic of Korea
2EST, Hwaseong, 18487, Republic of Korea
3School of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea |
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Received: April 21, 2023; Revised: September 4, 2023 Accepted: September 17, 2023. Published online: October 6, 2023. |
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| ABSTRACT |
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The plasma-resistant properties of surfaces coated with synthesized and commercial yttrium oxyfluoride materials, respectively, were investigated by exposing them to fluorine-based NF3 plasma. Yttrium oxyfluoride (YOF) powder (30.8 μm, 99.8% purity), synthesized via a solid-state wet chemical process, and commercially available YOF powder (31.0 μm, 99.9%, purity) were used as spraying materials for deposition on aluminum (Al) substrates using the atmospheric plasma spraying (APS) technique. PECVD-NF3 plasma was used to study the etching resistance of the YOF coating samples. The surface morphology and phase compositions of these coatings, and their ability to resist fluoro-based plasma etching were systematically characterized by various techniques. X-ray photoelectron spectroscopy (XPS) revealed variations in the elemental and chemical compositions of the coated surfaces of the two YOF specimens after fluorination. After exposure to plasma, the relative intensity ratio of Y–F to Y–O peaks of the synthesized and commercial YOF coatings were 1.37 and 1.35, respectively. These results indicate that the synthesized YOF coating treated with NF3 plasma offers higher resistance against plasma than the commercial YOF coating, and thus accumulates fewer contamination particles. The synthesized YOF ceramic material therefore is a promising candidate for application as chamber coating material, for example in the semiconductor manufacturing process. |
| Key words:
Yttrium oxyfluoride · Solid-state wet chemical process · Atmospheric plasma spray · NF3 plasma etching · Plasma resistance. |
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