Nanoindentation experiments on some thin films on silicon

,; ,

J. Korean Ceram. Soc. > Volume 37(6); 2000 > Article

Journal of the Korean Ceramic Society 2000;37(6): 596.

Nanoindentation 방법에 의한 박막의 경도 및 탄성계수 측정

한준희

한국표준과학연구원

Nanoindentation experiments on some thin films on silicon

ABSTRACT

The hardness and elastic modulus of three bulk materials are computed from the load and displacement data which are measured during basic nanoindentation test and compared with values determined by independent means to assess the accuracy of the method. The results show that with this technique, modulus and hardness and elastic modulus profile through depth of silicon nitride and silicon oxynitride films. The results show that for silicon nitride film deposited on silicon, hardness and elastic modulus increase as the volume ratio of NH3 : SiH4, which had been used for deposition, increases up to 20.0; and for silicon oxynitride film on silicon, the hardness and elastic modulus profile changes distinctly as the relative amount of oxygen in deposition gas mixture changes.

Key words: Nanoindentation, Hardness, Elastic modulus, Thin film