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Correlations between Electrical Properties and Process Parameters of Silicon Nitride Films Prepared by Low Temperature (100℃) Catalytic CVD
Se Myoung Noh, Wan-Shick Hong
J. Korean Ceram. Soc.
2015;52(3):209
DOI:
https://doi.org/10.4191/kcers.2015.52.3.209
1
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Materials Science, Ceramics - Q1
Journal Impact Factor 2.5