Growing Behavior of AlN Thin Film Deposited by Asymmetric Bipolar Pulsed DC Reactive Sputtering

,; ,; ,; ,; ,; ,

J. Korean Ceram. Soc. > Volume 38(1); 2001 > Article

Journal of the Korean Ceramic Society 2001;38(1): 61.

비대칭 펄스 직류 반응성 스퍼터링으로 증착된 AlN 박막의 성장 거동

김주형, 이전국¹, 안진호²

한국과학기술연구원 박막기술연구센터, 한양대학교 재료공학과
¹한국과학기술연구원 박막기술연구센터
²한양대학교 재료공학과

Growing Behavior of AlN Thin Film Deposited by Asymmetric Bipolar Pulsed DC Reactive Sputtering

Key words: AlN, Pulsed dc, Arc, Duty cycle Pulse frequency

TOOLS

PDF Links

Full text via DOI

Download Citation

METRICS

1,290

View

Download

Crystal Structure, Microstructure and Mechanical Properties of NbN Coatings Deposited by Asymmetric Bipolar Pulsed DC Sputtering 2017 January;54(1)

Growing Behavior of Nanocrystalline TiN Films by Asymmetric Pulsed DC Reactive Magnetron Sputtering 2011 ;48(5)

Growing and Luminous Characterization of ZnGa₂O₄:Mn Thin Film Deposited by RF Magnetron Sputtering 2003 ;40(7)

Room Temperature Deposition and Heat Treatment Behavior of ATO Thin Films by Ion Beam Sputtering 2000 ;37(11)

Deposition of AIN Thin Films by Single Ion Beam Sputtering 1997 ;34(2)

Editorial Office
Meorijae Bldg., Suite # 403, 76, Bangbae-ro, Seocho-gu, Seoul 06704, Korea
TEL: +82-2-584-0185 FAX: +82-2-586-4582 E-mail: ceramic@kcers.or.kr

About | Browse Articles | Current Issue | For Authors and Reviewers