Room Temperature Deposition and Heat Treatment Behavior of ATO Thin Films by Ion Beam Sputtering

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J. Korean Ceram. Soc. > Volume 37(11); 2000 > Article

Journal of the Korean Ceramic Society 2000;37(11): 1025.

이온빔 스퍼터링에 의한 ATO 박막의 실온 증착 및 열처리에 따른 특성변화

구창영, 김경중¹, 김광호², 이희영

영남대학교 재료금속공학부
¹한국표준과학연구소 표면분석그룹
²부산대학교 무기재료공학과

Room Temperature Deposition and Heat Treatment Behavior of ATO Thin Films by Ion Beam Sputtering

Key words: Tin oxide, ATO, Thin film, Ion-beam sputter deposition(IBSD), Transparent electrode, Reactive sputtering

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