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J. Korean Ceram. Soc. > Volume 51(5); 2014 > Article
Journal of the Korean Ceramic Society 2014;51(5): 375.
doi: https://doi.org/10.4191/kcers.2014.51.5.375
DC 스퍼터법과 유도결합 플라즈마를 이용한 마그네트론 스퍼터링으로 제작된 나노결정질 TiAlN 코팅막의 물성 비교 연구
전성용, 김세철
목포대학교 신소재공학과
A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering
Sung-Yong Chun, Se-Chul Kim
Department of Advanced Materials Science and Engineering, Mokpo National University
Nanocrystalline TiAlN coatings were prepared by reactively sputtering TiAl metal target with $N_2$ gas. This was done using a magnetron sputtering system operated in DC and ICP (inductively coupled plasma) conditions at various power levels. The effect of ICP power (from 0 to 300 W) on the coating microstructure, corrosion and mechanical properties were systematically investigated using FE-SEM, AFM and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of TiAlN coatings. With increasing ICP power, the coating microstructure evolved from the columnar structure typical of DC sputtering processes to a highly dense one. Average grain size of TiAlN coatings decreased from 15.6 to 5.9 nm with increasing ICP power. The maximum nano-hardness (67.9 GPa) was obtained for the coatings deposited at 300 W of ICP power. The smoothest surface morphology (Ra roughness 5.1 nm) was obtained for the TiAlN coating sputtered at 300 W ICP power.
Key words: Inductively coupled plasma, ICP power, TiAlN coatings, Nanocrystalline, Comparative study
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