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J. Korean Ceram. Soc. > Volume 50(6); 2013 > Article
Journal of the Korean Ceramic Society 2013;50(6): 390.
doi: https://doi.org/10.4191/kcers.2013.50.6.390
DC 스퍼터법과 비대칭 양극성 펄스 스퍼터법으로 제작된 고분자 전해질 연료전지 금속분리판용 CrN 코팅막의 특성 연구
박상원, 전성용
목포대학교 신소재공학과
A Comparative Study of CrN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering for a Polymer Electrolyte Membrane Fuel Cell (PEMFC) Metallic Bipolar Plate
Sang-Won Park, Sung-Yong Chun
Department of Advanced Materials Science and Engineering, Mokpo National University
Nanocrystalline CrN films were deposited on Si (100) substrates by means of asymmetric pulsed DC reactive magnetron sputtering. We investigated the growth behavior, corrosion resistance and mechanical properties of CrN films with a change in the duty cycle and pulse frequency. The grain size of the CrN films decreased from 25.4 nm to 11.2 nm upon a decrease in the duty cycle. The corrosion potentials for the CrN films by DC sputtering was approximately - 0.6 V, and it increased to - 0.3 V in the CrN films which underwent pulsed sputtering. The nanoindentation hardness of the CrN films also increased with a decrease in the duty cycle. This enhancement of the corrosion resistance and mechanical properties of pulsed sputtered CrN films could be attributed to the densification and surface smoothness of the microstructure of the films.
Key words: Pulsed sputtering, Asymmetric bipolar, Pulse parameters, Nanocrystalline
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