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J. Korean Ceram. Soc. > Volume 49(6); 2012 > Article
Journal of the Korean Ceramic Society 2012;49(6): 556.
doi: https://doi.org/10.4191/kcers.2012.49.6.556
유도결합 플라즈마를 이용한 마그네트론 스퍼터링으로 증착된 나노결정질 CrN 코팅막의 성장
서대한, 전성용
목포대학교 신소재공학과
Growth Behavior of Nanocrystalline CrN Coatings by Inductively Coupled Plasma (ICP) Assisted Magnetron Sputtering
Dae-Han Seo, Sung-Yong Chun
Department of Advanced Materials Science and Engineering, Mokpo National University
ABSTRACT
Nanocrystalline CrN coatings were deposited by DC and ICP-assisted magnetron sputtering on Si (100) substrates. The influences of the ICP power on the microstructural and crystallographic properties of the coatings were investigated. For the generation of the ICP, radio frequency was applied using a dielectric-encapsulated coil antenna installed inside the deposition chamber. As the ICP power increased from 0 to 500W, the crystalline grain size decreased. It is believed that the decrease in the crystal grain size at higher ICP powers is due to resputtering of the coatings as a result of ion bombardment as well as film densification. The preferential orientation of CrN coatings changed from (111) to (200) with an increase in the ICP power. The ICP magnetron sputtering CrN coatings showed excellent surface roughness compared to the DC magnetron sputtering coatings.
Key words: Inductively coupled plasma, ICP power, Crystal grain size, Preferential orientation
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