| 열처리 온도에 따른 8YSZ 후막의 미세구조 |
| 한상훈, 노효섭1, 나동명1, 김광호1, 이운영2, 박진성 |
조선대학교 신소재공학과
1가우스텍 주식회사
2조선대학교 공학기술연구원 |
| Heat Treatment Effect on the Microstructure of 8YSZ Thick Film |
| Sang-Hoon Han, Hyo-Seop Noh1, Dong-Myung Na1, Guang-Hu Jin1, Woon-Young Lee2, Jin-Seong Park |
Department of Advanced Materials Engineering, Chosun University
1Department of Product Development, Gaustek Co. Ltd.
2The Research Institute of Advanced Engineering Technology, Chosun University |
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| ABSTRACT |
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In order to fabricate 8YSZ thick film by silk screen printing, YSZ(yttria-stabilized zirconia) commercial powder was used as starting materials. Paste for screen printing was made by mixing 8YSZ powder and organic vehicles. 8YSZ thick film was formed on $Al_2O_3$ substrate. The crystal structure, and microstructure were investigated. Grain size of 8YSZ was increased with increasing calcination temperature and rapid grain growth was shown after calcination at $1300^{circ}C$. Microstructure showed the mixture of large and small grain size after $1400^{circ}C$ sintering. Shrinkage rate of 8YSZ thick film sintered at $1400^{circ}C$ was more than 40%. |
| Key words:
YSZ, Thick film, Calcination temperature, Sintering temperature, Microstructure |
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