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J. Korean Ceram. Soc. > Volume 48(1); 2011 > Article
Journal of the Korean Ceramic Society 2011;48(1): 106.
doi: https://doi.org/10.4191/kcers.2011.48.1.106
열처리 온도에 따른 8YSZ 후막의 미세구조
한상훈, 노효섭1, 나동명1, 김광호1, 이운영2, 박진성
조선대학교 신소재공학과
1가우스텍 주식회사
2조선대학교 공학기술연구원
Heat Treatment Effect on the Microstructure of 8YSZ Thick Film
Sang-Hoon Han, Hyo-Seop Noh1, Dong-Myung Na1, Guang-Hu Jin1, Woon-Young Lee2, Jin-Seong Park
Department of Advanced Materials Engineering, Chosun University
1Department of Product Development, Gaustek Co. Ltd.
2The Research Institute of Advanced Engineering Technology, Chosun University
In order to fabricate 8YSZ thick film by silk screen printing, YSZ(yttria-stabilized zirconia) commercial powder was used as starting materials. Paste for screen printing was made by mixing 8YSZ powder and organic vehicles. 8YSZ thick film was formed on $Al_2O_3$ substrate. The crystal structure, and microstructure were investigated. Grain size of 8YSZ was increased with increasing calcination temperature and rapid grain growth was shown after calcination at $1300^{circ}C$. Microstructure showed the mixture of large and small grain size after $1400^{circ}C$ sintering. Shrinkage rate of 8YSZ thick film sintered at $1400^{circ}C$ was more than 40%.
Key words: YSZ, Thick film, Calcination temperature, Sintering temperature, Microstructure
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