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J. Korean Ceram. Soc. > Volume 47(6); 2010 > Article
Journal of the Korean Ceramic Society 2010;47(6): 618.
doi: https://doi.org/10.4191/kcers.2010.47.6.618
플라즈마 토치와 전자빔을 이용한 금속급 실리콘 정제
음정현, 남산1, 황광택, 김경자, 최균
한국세라믹기술원 이천분원
1고려대학교 신소재공학과
Purification of Metallurgical Grade Silicon by Plasma Torch and E-beam Treatment
Jung-Hyun Eum, Sahn Nahm1, Kwang-Taek Hwang, Kyung-Ja Kim, Kyoon Choi
Icheon Branch, KICET
1Division of Material Science and Engineering, Korea University
Cost-effective purification methods of silicon were carried out in order to replace the conventional Siemens method for solar grade silicon. Firstly, acid leaching which is a hydrometallurgical process was preceded with grinded silicon powders of metallurgical grade (~99% purity) to remove metallic impurities. Then, plasma treatments were performed with the leached silicon powders of 99.94% purity by argon plasma at 30 kW power under atmospheric pressure. Plasma treatment was specifically efficient for removing Zr, Y, and P but not for Al and B. Another purification step by EB treatment was also studied for the 99.92% silicon lump which resulted in the fast removal of boron and aluminum. That means the two methods are effective alternative tools for removing the doping elements like boron and phosphor.
Key words: Solar grade silicon, Metallurgical grade silicon, Purification, Plasma treatment, Electron-beam treatment
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