| 증착온도 변화에 따른 화학증착 ZrC의 미세구조와 경도 변화 |
| 박종훈, 정충환, 김원주, 김도진1, 박지연 |
한국원자력연구원 원자력재료연구부
1충남대학교 재료공학과 |
| Microstructure and Hardness Changes of the CVD-ZrC Film with Different Deposition Temperature |
| Jong-Hoon Park, Choong-Hwan Jung, Weon-Ju Kim, Do-Jin Kim1, Ji-Yeon Park |
Nuclear Materials Research Division, Korea Atomic Energy Research Institute
1Department of Materials Engineering College of Engineering, Chungnam National University |
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| ABSTRACT |
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The properties of a grown film by the chemical vapor deposition process depend on the deposition temperature because the deposition mechanism of the CVD film is controlled by the deposition temperature. The preferred orientation of the zrC film changed from (111) to (220) or (200) with an increase of the deposition temperature. The grain size of the ZrC film changes from $0.8{mu}m$ to $2.5{mu}m$ in the range of 1350 to $1500^{circ}C$. The hardness of the deposited ZrC film depended on the preferred orientation and the grain size. The hardness of the ZrC film deposited at $1400^{circ}C$ was 31 GPa. |
| Key words:
Zirconium carbide, CVD, Deposition temperature, Preferred orientation, Grain size, Hardness |
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