Deposition Properties of NiCr Thin Films Prepared by Thermal Evaporation

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doi:2004.41.6.450

J. Korean Ceram. Soc. > Volume 41(6); 2004 > Article

Journal of the Korean Ceramic Society 2004;41(6): 450.
doi: https://doi.org/10.4191/kcers.2004.41.6.450

Thermal Evaporation법으로 제조한 NiCr 박막의 증착 특성

권용, 박용주¹, 최승평², 정진², 최광표³, 류현욱³, 박진성

조선대학교 신소재공학과
¹조선대학교 신소재공학
²조선대학교 물리학
³조선대학교 에너지자원신기술연구

Deposition Properties of NiCr Thin Films Prepared by Thermal Evaporation

ABSTRACT

NiCr thin films were fabricated by thermal evaporation method using NiCr alloy as evaporating source. NiCr thin films were annealed at various temperatures in air atmosphere in order to investigate effects of annealing conditions on phase change, composition, and microstructures of NiCr films. Typical multilayer was formed after annealing in air atmosphere. This results from the diffusion and oxidation of Cr toward surface during annealing. In the case of annealing at 700$^{circ}C$, large columnar grains of NiO were formed on Cr-oxide layer through the diffusion and oxidation of Ni over Cr-oxide layer. Especially, NiO layer was formed additionally on surface, sustaining the underlayer structure with the formation of porous Ni layer.

Key words: NiCr thin film, Themal evaporation, Auger depth profile, Diffusion, Oxidation