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J. Korean Ceram. Soc. > Volume 41(6); 2004 > Article
Journal of the Korean Ceramic Society 2004;41(6): 476.
doi: https://doi.org/10.4191/kcers.2004.41.6.476
펄스 DC 마그네트론 스퍼터링법에 의한 ZnO:Al 박막 증착시 펄스 주파수의 영향
고형덕, 이충선1, 태원필2, 서수정3, 김용성
성균관대학교 정보통신용 신기능성 소재 및 공정연구센터
1아주대학교 물리학
2인하대학교 소재연구
3성균관대학교 정보통신용 신기능성 소재 및 공정연구센
Effect of Pulse Frequency on the Properties of ZnO:Al Thin Films Prepared by Pulsed DC Magnetron Sputtering
AZO (Al-doped ZnO) thin films were deposited on glass by pulsed magnetron sputtering method, and their structural, electrical and optical properties were investigated. XRD patterns showed that a highly c-axis preferred AZO film was grown in perpendicular to the substrate when pulse frequency of 30 ㎑ was applied to the target. Microstructure of thin films showed that the fibrous grain of tight dome shape was grown. The deposition rate decreased linearly with increase of pulse frequency, and the lowest resistivity was 8.67${times}$10$^$-4/ $Omega$-cm for the film prepared at pulse frequency of 30 ㎑. The optical transmittance spectra of the films showed a very high transmittance of 85∼90%, within visible wavelength region and exhibited the absorption edge of about 350 nm. The characteristics of the low electrical resistivity and high optical transmittance of AXO films suggested a possibility for the application to transparent conducting oxides.
Key words: Pulsed dc magnetron sputter, Al-doped ZnO, Pulse frequency, Optical properties
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