| RF-magnetron Sputtering법에 의해 제조된 SnO2 박막 특성에 대한 열처리 분위기 효과 |
| 최광표, 박용주, 류현욱, 노효섭1, 권용1, 박진성1 |
조선대학교 에너지자원신기술연구소
1조선대학교 신소재공학과 |
| Effects of Annealing Atmosphere on the Characteristics of Tin Oxide Films Prepared by RF-magnetron Sputtering |
| Gwang-Pyo Choi, Yong-Ju Park, Hyun-Wook Ryu, Whyo-Sup Noh1, Yong Kwon1, Jin-Seong Park1 |
Research Institute of Energy Resources Technology, Chosun University
1Department of Advanced Materials Engineering, Chosun University |
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| ABSTRACT |
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$SnO_2$ thin films were deposited on a $SiO_2$/Si substrate with the flow of Ar and $O_2$ of 25 sccm by RF-magnetron sputtering method. the post-annealing was conducted at $500^{circ}C$ in atmosphere of dry air and $N_2$ were changed fairly, while those annealed in dry air resembled as-deposited films. This may be attributed to the desorption of adsorbed oxygen and the extraction of lattice oxygen during annealing. Resistivity of films annealed in $N_2$ was increased over 5 times than that of as-deposited films. It can be explained that the increment of resistivity may result from the discontinuous conduction path with change of microstructures after annealing in $N_2$. |
| Key words:
Thin films, Tin dioxide, Annealing, XPS |
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