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J. Korean Ceram. Soc. > Volume 39(10); 2002 > Article
Journal of the Korean Ceramic Society 2002;39(10): 981.
doi: https://doi.org/10.4191/kcers.2002.39.10.981
콜로이드 입자의 자기 배열성을 이용한 Monolayer 형성에 관한 연구
고화영, 이해원1, 김주선1, 문주호
연세대학교 세라믹 공학과
1한국과학기술연구원 나노재료연구센터
Process Development of Self-Assembled Monolayers(SAMs) of Colloidal Particles
Hwa-Young Ko, Hae-Weon Lee1, Joo-Sun Kim1, Joo-Ho Moon
Department of Ceramic Engineering, Yonsei University
1Nano-Materials Research Center, KIST
ABSTRACT
Monodispersed colloidal silica was prepared by Stober process. We have synthesized monodispersed colloidal silica of carious sizes (100 nm, 200 nm, 300 nm) by controlling volume ratios of TEOS(Tetraethylorthosilicate), $NH_4OH$, Ethanol and D. I. water. Shape and monodispersity of the synthesized colloidal particles were observed by Scanning Electron Microscopy(SEM) and laser light scattering particle analyzer. Self-assembled monolayer of monodispersed colloids was achieved by dipping Si substrate into a well-dispersed silica suspension. It was determined that uniformity and spatial extent of the self-assemble monolayer of monodispersed colloids are significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5 mm ${times}$ 1.5 mm) as confirmed by SEM.
Key words: Colloidal sillica, Stober process, Self-assembled, Monolayer, Dip coating
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