| 콜로이드 입자의 자기 배열성을 이용한 Monolayer 형성에 관한 연구 |
| 고화영, 이해원1, 김주선1, 문주호 |
연세대학교 세라믹 공학과
1한국과학기술연구원 나노재료연구센터 |
| Process Development of Self-Assembled Monolayers(SAMs) of Colloidal Particles |
| Hwa-Young Ko, Hae-Weon Lee1, Joo-Sun Kim1, Joo-Ho Moon |
Department of Ceramic Engineering, Yonsei University
1Nano-Materials Research Center, KIST |
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| ABSTRACT |
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Monodispersed colloidal silica was prepared by Stober process. We have synthesized monodispersed colloidal silica of carious sizes (100 nm, 200 nm, 300 nm) by controlling volume ratios of TEOS(Tetraethylorthosilicate), $NH_4OH$, Ethanol and D. I. water. Shape and monodispersity of the synthesized colloidal particles were observed by Scanning Electron Microscopy(SEM) and laser light scattering particle analyzer. Self-assembled monolayer of monodispersed colloids was achieved by dipping Si substrate into a well-dispersed silica suspension. It was determined that uniformity and spatial extent of the self-assemble monolayer of monodispersed colloids are significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5 mm ${times}$ 1.5 mm) as confirmed by SEM. |
| Key words:
Colloidal sillica, Stober process, Self-assembled, Monolayer, Dip coating |
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