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J. Korean Ceram. Soc. > Volume 38(6); 2001 > Article
Journal of the Korean Ceramic Society 2001;38(6): 531.
PECVD법에 의한 3C-SiC막 증착(I): 증착변수에 따른 SiC 증착거동
김광호, 서지윤, 윤석영
부산대학교 무기재료공학과
Deposition of 3C-SiC Films by Plasma-enhanced Chemical Vapor Deposition (I): Deposition Behaviors of SiC with Deposition Parameters
Key words: 3C-SiC films, PECVD, Crystallinity, Free silicon
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