Deposition of Large Area SiC Thick Films by Low Pressure Chemical Vapor Deposition (LPCVD) Method

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J. Korean Ceram. Soc. > Volume 38(5); 2001 > Article

Journal of the Korean Ceramic Society 2001;38(5): 485.

저압 화학증착법에 의한 대면적 SiC 후막의 증착

김원주, 박지연, 김정일, 홍계원, 하조웅¹

한국원자력연구소 기능성재료분야
¹이노쎄라(주)

Deposition of Large Area SiC Thick Films by Low Pressure Chemical Vapor Deposition (LPCVD) Method

Key words: Chemical vapor deposition, SiC, Graphite

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