Temperature Dependence of the Deposition Behavior of Yttria-stabilized Zirconia CVD Films: Approach by Charged Cluster Model

Hwang, Nong-Moon; Jeon, In-Deok; , Latifa Gueroudji; Kim, Doh-Yeon; Hwang, Nong-Moon; Jeon, In-Deok; , Latifa Gueroudji; Kim, Doh-Yeon

J. Korean Ceram. Soc. > Volume 38(3); 2001 > Article

Journal of the Korean Ceramic Society 2001;38(3): 218.

Nong-Moon Hwang, In-Deok Jeon¹, Latifa Gueroudji , Doh-Yeon Kim¹

Korea Research Institute of Standards and Science
¹Center for Microstructure Science of Materials, School Mater. Sci. & Eng. Seoul National University

ABSTRACT

Yttria-stabilized zirconia (YSZ) films were deposited with varying temperatures of ZrCl$_4$between 250~55$0^{circ}C$ with YCl$_3$and the substrate at 100$0^{circ}C$. Nanoamperes per square centimeter of the electric current were measured in the reactor during deposition and the current increased with increasing evaporation temperature of ZrCl$_4$. The zirconia nanometer size clusters were captured on the grid membrane near the substrate during the CVD process and observed by transmission electron microscopy (TEM). The deposition rate decreased with increasing evaporation temperature of ZrCl$_4$. A cauliflower-shaped structure was developed at 25$0^{circ}C$ then gradually changed to a faceted-grain structure above 35$0^{circ}C$. Dependence of the growth rate and the morphological evolution on the evaporation temperature of ZrCl$_4$was approached by the charged cluster model.

Key words: YSZ, $ZrO_2$, CVD, Charged clusters, Current, Thin films