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J. Korean Ceram. Soc.
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Volume 37(11); 2000
> Article
Journal of the Korean Ceramic Society 2000;37(11): 1051.
절연막이 후 열처리가 Metal/Ferroelectric/Insulator/Semiconductor 구조의 전기적 특성에 미치는 영향
원동진, 왕채현, 최두진
연세대학교 공과대학 세라믹공학과
Effects of the Post-annealing of Insulator on the Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor Structure
Key words:
MFIS(Metal/Ferroelectric/Insulator/Semiconductor)
,
Post annealing
,
Interfacial layer
,
$PbTiO_3$
,
$CeO_2$
,
$TiO_2$
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