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J. Korean Ceram. Soc. > Volume 37(1); 2000 > Article
Journal of the Korean Ceramic Society 2000;37(1): 96.
Si가 Ti-Si-N 코팅막의 기계적 성밀 및 내산화특성에 미치는 영향
박범희, 김정애, 이종영1, 김광호
부산대학교 무기재료공학과
1부산대학교 생산기술연구소
Effect of Si on Mechanical and Anti-oxidation Properties of Ti-Si-N Coating
ABSTRACT
Comparative studies on microstructure, and mechanical and anti-oxidation properties between TiN and Ti-Si-N films were performed. The Ti-Si-N films were deposited on high-speed steel and silicon wafer substrates by plasma-assisted chemcial vapor deposition(PACVD) technique. The Si addition to TiN film caused to change the microstructure such as grain size refinement, randomly multi-oriented microstructure, and nano-sized codeposition of silicon nitride in the TiN matrix. The Ti-Si-N film, contains Si content of ∼7 at.%, showed the micro-hardness value of ∼3400 HK, which was higher than the pure TiN film whose hardness was ∼1500HK. The Ti-Si(7 at.%)-N film also showed much improved anti-oxidation properties compared with those of the pure TiN film. These properties were also related to the microstructure of Ti-Si(7 at.%)-N film was formed and retarded further oxidation of the nitridelayer. These properties were also related to the microstructure of Ti-Si(7 at.%)-N film which was characterized by nano-sized precipitates of silicon nitride phase in the TiN matrix and randomly oriented grains.
Key words: PACVD, Ti-Si-N film, Silicon nitride, Micro-hardness, Anti-oxidation, Microstructure
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