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Journal of the Korean Ceramic Society 1998;35(4): 364. |
| FHD법에 의한 $B_2O_3-P_2O_5-SiO_2$ 실리카막의 효과적인 $P_2O_5$ 도핑 |
| 심재기, 이윤학, 성희경, 최태구 |
| 한국전자통신연구원 통신부품연구실 |
| The Effective $P_2O_5$ Doping into $B_2O_3-P_2O_5-SiO_2$ Silica Layer Fabrication by Flame Hydrolysis Deposition |
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| ABSTRACT |
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Boron-phoshor-silicate glass was fabricated on Si substrates by FHD(Flame Hydrolysis Deposition) The microstructrue of silica soot deposited at various conditon such as composition and substrate temperature was analysed by SEM. After consolidation the refractive index and composition of the silica layer were in-vestigated. For refractive index control B, P and Ge were used as additive elements while B and Ge oxides are easily mixed into $SiO_2$, P oxide($B_2O_3$) doping is difficult because of the volatile property due to low melt-ing point. Boron-phosphorous-silicate glass (BPSG) layer were fabricated using bertical torch and optimized flame temperature substrate temperature and distance of torch and substrate. P concentration of BPSG lay-er measured 3.3 Wt% and the consolidation temperature was lower than $1180^{circ}C$. The measured refractive index of BPSG silica layer in $1.55;mutextrm{m}$ wavelength was $1.4480{pm}1{times}10^{-1}$ and the thickness was $22{pm}1;mutextrm{m}$. |
| Key words:
Flame hydrolysis deposition, Silica waveguide, Consolidation |
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