| 기판온도 및 스퍼터가스에 따른 ZnO 박막의 우선배향성, 화학조성, 물리적특성 변화 |
| 김병진, 조남희 |
| 인하대학교 무기재료공학과 |
| Effects of Substrate Temperature and Sputter Gas on the Physical Characteristics, Chemical Composition and Preferred Orientation of ZnO Thin Films |
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| ABSTRACT |
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ZnO thin films were prepared by rf-magnetron sputter at various conditions. Crystallinity, microstructure, chemical composition, and optical composition, and optical properties of the films were investigated as functions of substrate temperature (R. T.-50$0^{circ}C$) an sputter gas (O2/Ar=0-50%). ZnO thin films grown at 50$0^{circ}C$ with sputter gas of pure argon as well as at R. T. with sputter gas of a mixture of argon & oxygen(O2/Ar=2%) exhibit a strong tendency of (002) preferred orientation, compared with a considerable random orientation at the other conditions. The thin films with (002) preferred orientation has a chemical stoichiometry of Zn/O-1.01, a band gap of 3.3eV, and a packing density of 98% respectively. |
| Key words:
ZnO thin film, Rf-magnetron sputter, Preferred orientation, Chemical stoichiometry |
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