| YSZ 박막의 성장속도와 특성에 미치는 전기화학증착 조건의 영향(I) |
| 박동원, 전치훈, 강대갑1, 최병진, 김대룡 |
경북대학교 공과대학 금속공학과
1한국원자력연구소 핵연료개발그룹 |
| Influences of Electrochemical Vapor Deposit Conditions Growth Rate and Characteristics of YSZ Thin Films (I) |
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| ABSTRACT |
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Yttria stabilized zirconia (YSZ) thin films were prepared by the electrochemical vapor deposition (EVD) method on the porous Al2O3 substrates which were fabricated by different substrate thickness and porosity. Film growth rates decreased with increase on the substrate thickness and porosity and obeyed a parabolic rate law. Activa-tion energy calculated from the parabolic rate onstants was 69.9 kcal/mol. With increase on the deposition time, monoclinic phase was appeared and then disappeared. YSZ penetrated deeply into substrates when the EVD temperature decreased. Electrical conductivity of the films was 0.09 S/cm at 100$0^{circ}C$ similar to the value of YSZ single crystal. |
| Key words:
EVD, YSZ, Prabolic rate law, Electrical conductivity |
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