| 화학증착에 의한 TiN 박막의 제조 및 기계적 성질에 관한 연구 |
| 김시범, 김광호1, 천성순 |
한국과학기술원 재료공학과
1부산대학교 무기재료 공학과 |
| Studies on Film Growth and Mechanical Properties of TiN by Chemical Vapor Deposition |
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| ABSTRACT |
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Titanium Nitride (TiN) was deposited onto the SKH9 tool steels by chemical vapor deposition (CVD) using a gaseous mixture of TiCl4, N2, and H2. The effects of the deposition temperature and input gas composition on the deposition rate, microstructure, preferred orientation, microhardness and wear resistance of TiN deposits were studied. The experimental results showed that the TiN deposition is thermally activated process with an apparent activation energy of about 27Kcal/mole in the temperature range between 1200$^{circ}$K and 1400$^{circ}$K. As H2/N2 gas input ratio increased, the deposition rate increased, showed maximum at H2/N2 gas input ratio of 1.5 and then decreased. Mechanical properties such as microhardness and wear resistance have close relation with the microstructure and preferred orientation of TiN deposits. It is suggested that the equiaxed structure with random orientation increases the microhardness and wear resistance of TiN deposits. |
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