Epitaxial Growth of Nickel Silicide <TEX>$(NiSi_2)$</TEX> in Vacuum Deposited Nickel and Gold Films on (III) Silicon Single Crystals

,; ,; ,; ,

J. Korean Ceram. Soc. > Volume 13(3); 1976 > Article

Journal of the Korean Ceramic Society 1976;13(3): 55.

규소(III) 단 결정에 진공 증착한 닉켈과 금 박막에서 $NiSi_2$의 적층성장

윤기현, 이희수¹

Epitaxial Growth of Nickel Silicide $(NiSi_2)$ in Vacuum Deposited Nickel and Gold Films on (III) Silicon Single Crystals

Hongneung Machine Industry Co., LTD.
¹Department of Ceramic Engineering, Yonsei University

TOOLS

PDF Links

Full text via DOI

Download Citation

METRICS

965

View

Download

Editorial Office
Meorijae Bldg., Suite # 403, 76, Bangbae-ro, Seocho-gu, Seoul 06704, Korea
TEL: +82-2-584-0185 FAX: +82-2-586-4582 E-mail: ceramic@kcers.or.kr

About | Browse Articles | Current Issue | For Authors and Reviewers