| La-Gd-Y 희토류계 산화물-알루미나 세라믹스의 상안정화 영역과 내플라즈마 특성 |
| 김경범, 이성민 |
| 한국세라믹기술원 이천분원 엔지니어링세라믹센터 |
| Phase Stability and Plasma Erosion Resistance of La-Gd-Y Rare-earth Oxide - Al2O3 Ceramics |
| Kyeong-Beom Kim, Sung-Min Lee |
| Engineering Ceramics Center, Korea Institute of Ceramic Engineering and Technology |
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| ABSTRACT |
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In this study, we have investigated new plasma resistant materials with less usage of rare-earth oxides than $Y_2O_3$ which is currently used in the semiconductor industry. We observed the stability ranges of $(Gd{cdot}Y)_3Al_5O_{12}$ and $(La{cdot}Y)Al_{11}O_{18}$ ternary systems, and measured their etch rates under typical fluorine plasma. $(Gd{cdot}Y)_3Al_5O_{12}$ system showed an extensive solid solution up to 80 mol% gadolinium, but $(La{cdot}Y)Al_{11}O_{18}$ showed a negligible substitution between rare-earth ions, which can be explained by the differences between the ionic radii. The etch rates depended on the total amount of rare-earth oxides but not on the substitution of the rare-earth ions. When the specimen was examined using XPS after the exposure to fluorine plasma, the strong surface fluorination was observed with a shift of the binding energy to higher energy. |
| Key words:
Rare-earth oxide, Plasma resistance, Phase stability |
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