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J. Korean Ceram. Soc. > Volume 45(11); 2008 > Article
Journal of the Korean Ceramic Society 2008;45(11): 707.
doi: https://doi.org/10.4191/kcers.2008.45.1.707
EB-PVD법으로 코팅된 Y2O3의 내플라즈마 특성
김대민, 윤소영, 김경범, 김희식, 오윤석, 이성민
요업(세라믹)기술원 이천분원 구조세라믹부
Plasma Resistances of Yttria Deposited by EB-PVD Method
Dae-Min Kim, So-Young Yoon, Kyeong-Beom Kim, Hui-Sik Kim, Yoon-Suk Oh, Sung-Min Lee
Korea Institute of Ceramic Engineering and Technology
Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.
Key words: Plasma resistance, Yttria coating, EB-PVD
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