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Effective Oxygen-Defect Passivation in ZnO Thin Films Prepared by Atomic Layer Deposition Using Hydrogen Peroxide
Yue Wang, Kyung-Mun Kang, Minjae Kim, Hyung-Ho Park
J. Korean Ceram. Soc.. 2019;56(3):302-307.   Published online 2019 May 23    DOI: https://doi.org/10.4191/kcers.2019.56.3.11

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Effective Oxygen-Defect Passivation in ZnO Thin Films Prepared by Atomic Layer Deposition Using Hydrogen Peroxide
Journal of the Korean Ceramic Society. 2019;56(3):302-307   Crossref logo
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Growth of copper metal by atomic layer deposition using copper(I) chloride, water and hydrogen as precursors
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Growth of copper metal by atomic layer deposition using copper(I) chloride, water and hydrogen as precursors
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