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Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory
Ki-Young Kim, Jin-Hoon Yang, Dong-Gung Shin, Yeong-Cheol Kim
J. Korean Ceram. Soc.. 2017;54(5):443-447.   Published online 2017 September 29    DOI: https://doi.org/10.4191/kcers.2017.54.5.11

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Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory
Journal of the Korean Ceramic Society. 2017;54(5):443-447   Crossref logo
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Initial growth mechanism of atomic layer deposition of ZnO on the hydroxylated Si(100)-2×1: A density functional theory study
Applied Surface Science. 2009;255(11):5742-5745   Crossref logo
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Surface reaction mechanism of atomic layer deposition of HfO2 on Ge(100)-2×1: A density functional theory study
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Surface reaction mechanism of Y2O3 atomic layer deposition on the hydroxylated Si(100)-2×1: A density functional theory study
Applied Surface Science. 2009;255(16):7136-7141   Crossref logo
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Application of density functional theory to equilibrium adsorption of argon and nitrogen on amorphous silica surface
Applied Surface Science. 2005;252(3):548-561   Crossref logo
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Initial reaction of HfO2 atomic layer deposition on silicon surfaces with different oxygen levels: A density functional theory study
Thin Solid Films. 2007;515(11):4702-4708   Crossref logo
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Initial surface reactions in atomic layer deposition of HfSixOy and HfO2: A comparative study by density functional theory
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Density functional theory study of initial stage of HfO2 atomic layer deposition on hydroxylated SiO2 surface
Journal of Molecular Structure: THEOCHEM. 2007;803(1-3):23-28   Crossref logo
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Density functional theory study of initial stage of ZrO2 atomic layer deposition on Ge/Si(100)-(2×1) surface
Thin Solid Films. 2005;479(1-2):73-76   Crossref logo
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Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
Applied Surface Science. 1996;107:128-136   Crossref logo
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