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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Thomas Jeffrey Lomax Mustard, Hyunwook Shaun Kwak, Alexander Goldberg, Jacob Gavartin, Tsuguo Morisato, Daisuke Yoshidome, Mathew David Halls
J. Korean Ceram. Soc.. 2016;53(3):317-324.   Published online 2016 May 31    DOI: https://doi.org/10.4191/kcers.2016.53.3.317

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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Journal of the Korean Ceramic Society. 2016;53(3):317-324   Crossref logo
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Atomic Layer Deposition (ALD)
Vacuum Deposition Onto Webs, Films and Foils. 2015;361-369   Crossref logo
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Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin-film deposition
physica status solidi (b). 2017;254(10):1700091   Crossref logo
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Atomic layer deposition (ALD): from precursors to thin film structures
Thin Solid Films. 2002;409(1):138-146   Crossref logo
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Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor
Processes. 2013;1(2):128-152   Crossref logo
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UV-curable top coat protection against mechanical abrasion for atomic layer deposition (ALD) thin film barrier coatings
Surface and Coatings Technology. 2014;241:142-147   Crossref logo
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Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films
Chemical Vapor Deposition. 2014;20(7-8-9):217-223   Crossref logo
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ALD: Atomic Layer Deposition, Precise and Conformal Coating for Better Performance
Handbook of Manufacturing Engineering and Technology. 2013;1-33   Crossref logo
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Atomic Layer Deposition (ALD) of Metal Gates for CMOS
Applied Sciences. 2019;9(11):2388   Crossref logo
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Bis(tert-butylimido)-bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group
Chemical Vapor Deposition. 2008;14(3-4):71-77   Crossref logo
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