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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Thomas Jeffrey Lomax Mustard, Hyunwook Shaun Kwak, Alexander Goldberg, Jacob Gavartin, Tsuguo Morisato, Daisuke Yoshidome, Mathew David Halls
J. Korean Ceram. Soc.. 2016;53(3):317-324.   Published online 2016 May 31    DOI: https://doi.org/10.4191/kcers.2016.53.3.317

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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Journal of the Korean Ceramic Society. 2016;53(3):317-324   Crossref logo
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Atomic Layer Deposition (ALD)
Vacuum Deposition Onto Webs, Films and Foils. 2015;361-369   Crossref logo
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Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin-film deposition
physica status solidi (b). 2017;254(10):1700091   Crossref logo
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Atomic layer deposition (ALD): from precursors to thin film structures
Thin Solid Films. 2002;409(1):138-146   Crossref logo
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Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor
Processes. 2013;1(2):128-152   Crossref logo
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UV-curable top coat protection against mechanical abrasion for atomic layer deposition (ALD) thin film barrier coatings
Surface and Coatings Technology. 2014;241:142-147   Crossref logo
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Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films
Chemical Vapor Deposition. 2014;20(7-8-9):217-223   Crossref logo
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Bis(tert-butylimido)-bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group
Chemical Vapor Deposition. 2008;14(3-4):71-77   Crossref logo
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Time-scale analysis of atomic layer deposition processes: Predicting the transition from mass-transfer to kinetically limited regimes
physica status solidi (c). 2015;12(7):934-943   Crossref logo
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Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
Advanced Engineering Materials. 2016;19(2):1600593   Crossref logo
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