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HMDS Treatment of Ordered Mesoporous Silica Film for Low Dielectric Application
Tae-Jung Ha, Sun-Gyu Choi, Byoung-Gon Yu, Hyung-Ho Park
J. Korean Ceram. Soc.. 2008;45(1):48    DOI: https://doi.org/10.4191/kcers.2008.45.1.048

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Investigation of the effect of calcination temperature on HMDS-treated ordered mesoporous silica film
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The improvement of mechanical and dielectric properties of ordered mesoporous silica film using TEOS–MTES mixed silica precursor
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Application of ordered mesoporous SiO2 film for low power consumption in phase-change memory
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Mesoporous ordered silica structures modified by metal organic reagents and their application in catalytic Michael additions
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The application of an ordered mesoporous silica film to a GaAs device
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Reactive pore expansion during ammonia vapor post-treatment of ordered mesoporous silica prepared with mixed glucopyranoside and cationic surfactants
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Ordered Mesoporous Silica Materials
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