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Microstructure and Electrical Properties of ZnO Thin Film for FBAR with Annealing Temperature

Bong-Seok Kim, Young-Hun Kang, Yu-Hyuk Cho, Eung-Kwon Kim, Jong-Joo Lee, Young-Sung Kim

J. Korean Ceram. Soc.. 2006;43(1):42 DOI: https://doi.org/10.4191/kcers.2006.43.1.042

Effects of Low-Temperature Annealing on the Microstructure and Electrical Properties of Doped-ZnO Varistors

Pedro Durán, F. Capel, J. Tartaj, C. Moure

Key Engineering Materials. 2001;206-213:1389-1392

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The optical and electrical properties of gallium-doped ZnO thin film with post-annealing processes of various atmospheres

Chien-Sheng Huang, Ching-Chun Liu

Microelectronic Engineering. 2015;148:59-63

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Effect of Post Annealing Temperature on Surface Morphology and Photoluminescence Properties of ZnO Thin Film

Kevin Alvin Eswar, F.S. Husairi, Azlinda Ab Aziz, M. Rusop, Saifollah Abdullah

Advanced Materials Research. 2013;832:654-658

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Effect of Annealing Temperature on Structural and Optical Properties of (Cu, Al):ZnO Thin Film by Sol-Gel Method

Ying Xiang Yang, Qing Nan Shi, Hong Lin Tan

Advanced Materials Research. 2014;852:314-318

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Influence of Annealing Temperature on the Properties of Nanostructured ZnO Thin Film Prepared by Sol-Gel Method

M.S. Mansor, Mohamad Hafiz Mamat, Z. Mohamad, Mohamad Rusop

Advanced Materials Research. 2013;667:558-561

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Role of annealing temperature on electrical and optical properties of Al-doped ZnO thin films

Osman Gürbüz, Sadık Güner

Ceramics International. 2015;41(3):3968-3974

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Effect of annealing temperature on structural, optical and electrical properties of zinc oxide (ZnO) thin films deposited by spray pyrolysis technique

Yacine Aoun, Boubaker Benhaoua, Said Benramache, Brahim Gasmi

Optik. 2015;126(24):5407-5411

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Effect of annealing temperature and atmosphere on aluminum-doped ZnO/Au/aluminum-doped ZnO thin film properties

Chien-Hsun Chu, Hung-Wei Wu, Jow-Lay Huang

Thin Solid Films. 2016;605:121-128

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Effects of annealing temperature on microstructure and electrical properties of Mn–Co–Ni–O thin films

L. He, Z.Y. Ling, Y.T. Huang, Y.S. Liu

Materials Letters. 2011;65(11):1632-1635

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On the annealing temperature, penetration depth of oxygen and film thickness on the DC and AC electrical properties and nano-structure of Ti thin films

K. Khojier, H. Savaloni

Vacuum. 2010;84(6):770-777

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