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Silicidation of Co/M/(100) Si bilayer Structures
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J. Korean Ceram. Soc.. 1998;35(5):505

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Silicidation Mechanism of Co/(Refractory-Metal) Bilayer and Epitaxial Growth of CoSi2 on Si(100) Substrate
MRS Proceedings. 1993;320:   Crossref logo
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Silicidation of Titanium-Rich Titanium Boride Deposited by Co-Sputtering on Si (100)
MRS Proceedings. 2000;611:   Crossref logo
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Annealing of the Co/Hf bilayer on single Si, polycrystalline Si and SiO2
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Phase Transformation of Co Silicidation in the Co/Ti- and Ti/Co-Si(100) Systems
MRS Proceedings. 1993;311:   Crossref logo
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Silicidation behaviors of Co/Ti and Co/Hf bilayers on doped polycrystalline Si substrate
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Epitaxial cobalt silicide formation using a Co/TiSix bilayer on Si (100) by sputtering
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Phase and structure transformations in the titanium interlayer during the nickel silicidation on Si(100) substrate
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Ni(Pt) alloy silicidation on (100) Si and poly-silicon lines
Thin Solid Films. 2004;462-463:137-145   Crossref logo
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Direct Silicidation of Co on Si by Rapid Thermal Annealing
MRS Proceedings. 1985;52:   Crossref logo
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Co surface modification by bias sputtering in Cu/Co(Vb)/NiO/Si(100) magnetic multilayer structures
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