Silicidation Mechanism of Co/(Refractory-Metal) Bilayer and Epitaxial Growth of CoSi2 on Si(100) Substrate
MRS Proceedings. 1993;320: 
Silicidation of Titanium-Rich Titanium Boride Deposited by Co-Sputtering on Si (100)
MRS Proceedings. 2000;611:
Annealing of the Co/Hf bilayer on single Si, polycrystalline Si and SiO2
Journal of Neuroscience Methods. 2000;100(1-2):17-23
Phase Transformation of Co Silicidation in the Co/Ti- and Ti/Co-Si(100) Systems
MRS Proceedings. 1993;311:
Silicidation behaviors of Co/Ti and Co/Hf bilayers on doped polycrystalline Si substrate
Materials Science and Engineering: B. 1999;65(3):187-193
Epitaxial cobalt silicide formation using a Co/TiSix bilayer on Si (100) by sputtering
Surface and Coatings Technology. 2003;171(1-3):6-10
Phase and structure transformations in the titanium interlayer during the nickel silicidation on Si(100) substrate
Surface Science. 2007;601(18):4423-4427
Ni(Pt) alloy silicidation on (100) Si and poly-silicon lines
Thin Solid Films. 2004;462-463:137-145
Direct Silicidation of Co on Si by Rapid Thermal Annealing
MRS Proceedings. 1985;52:
Co surface modification by bias sputtering in Cu/Co(Vb)/NiO/Si(100) magnetic multilayer structures
physica status solidi (c). 2004;1(7):1744-1747