Application of Computational Fluid Dynamic Simulation to SiC CVD Reactor for Mass Production
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J. Korean Ceram. Soc. 2013;50(6):533 DOI: https://doi.org/10.4191/kcers.2013.50.6.533
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Improvement of uniformity in chemical vapor deposition of silicon carbide using CFD
Jin-Won Seo, Jun-Woo Kim, Yoon-Soo Hahn, Kyoon Choi, Jong-Heun Lee
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