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Electrical Characteristics of Al2O3/TaAlO4/SiO2 Multi-layer Films by Different Tunnel Oxide Thicknesses and Annealing Treatment
Jung-Tae Park, Hyo-June Kim, Doo-Jin Choi
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Effects of Thermal Heat Treatment Process on the Ferroelectric Properties of ReMnO3 (Re:Ho, Er) Thin Films
Eung Soo Kim, Jung-Hoon Chae
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Fabrication of Nd-Substituted Bi4Ti3O12 Thin Films by Metal Organic Chemical Vapor Deposition and Their Ferroelectrical Characterization
Hyoeng-Ki Kim, Dong-Kyun Kang, Byong-Ho Kim
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Nucleation Enhancing Effect of Different ECR Plasmas Pretreatment in the RUO2 Film Growth by MOCVD
Taejong Eom, Yunkyu Park, Chongmu Lee
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Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD
Hyun-Ah Park, Jong-Min Lim, Chong-Mu Lee
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A Study on fabrication of Ferroelectric SBT Thin Films by Liquid Delivery MOCVD Process
강동균, 백승규, 송석표, 김병호
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Electrical Properties of ReMnO3(Re:Y, Ho, Er) Thin Film Prepared by MOCVD Method
Eung Soo Kim, Jung-Hoon Chae, Seung-Gu Kang
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Preparation of AlN Thin Film with New Type of Single Precursor
최승철, 안창규, 한성환
J. Korean Ceram. Soc. 2001;38(8):761
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Preparation and Electrical Properties of $YMnO_3$Thin Film by MOCVD Method
김응수, 노승현, 김유택, 강승구, 심광보
J. Korean Ceram. Soc. 2001;38(5):474
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Photocatalytic Characteristics of $TiO_2$ Films by LPMOCVD
이하용, 박용환
J. Korean Ceram. Soc. 1999;36(12):1303
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Properties of TiO$_2$ Thin Film Deposited by LPMOCVD
이하용, 박용환, 고경현, 박정훈, 홍국선
J. Korean Ceram. Soc. 1999;36(9):901
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Effect of Rapid Thermal Annealing and Orientation of Si Substrate on Structural and Electrical Properties of MOCVD-grown TiO2 Thin Films
왕채현, 최두진
J. Korean Ceram. Soc. 1998;35(1):88
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Effect of Deposition Temperature and Oxygen on the Growth of $RuO_2$ Thin Films Deposited by Metalorganic Chemical Vapor Deposition
신웅철, 윤순길
J. Korean Ceram. Soc. 1997;34(3):241
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Characterization of $RuO_2$ Thin Films by Hot-wall Metal Organic Chemical Vapor Deposition
신웅철, 윤순길
J. Korean Ceram. Soc. 1996;33(9):969
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Dependences of $PbTiO_3$ Thin Films on Ti Bath Temperature and Deposition Temperature
왕채현, 한영기, 염상섭, 최두진
J. Korean Ceram. Soc. 1996;33(4):371
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Preparation and Electrical Properties of $SrTiO_3$ Thin Films by Plasma Enhanced Metal Organic Chemical vapor Deposition
김남경, 윤순길
J. Korean Ceram. Soc. 1996;33(2):177
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