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Surface analysis of yttrium oxyfluoride deposited via air plasma spraying for Erosion resistance against NF3 plasma
R. Kreethi, Yu-Jin Hwang, Ho-Young Lee, Jae-Hyuk Park, Kee-Ahn Lee
J. Korean Ceram. Soc. 2024;61(1):63-70. Published online October 6, 2023 DOI: https://doi.org/10.1007/s43207-023-00332-2
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Plasma‑resistant characteristics according to sintering conditions of CaO–Al2O3–SiO2 glass coating layer
Yoon Sung Jung, Kyung Won Min, Jae Ho Choi, Ji Sob Yoon, Won Bin Im, Hyeong-Jun Kim
J. Korean Ceram. Soc. 2022;59(1):86-93. Published online January 31, 2022 DOI: https://doi.org/10.1007/s43207-021-00149-x
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Sample Preparation for Microstructural Characterization of Ni–Yttria-Stabilized Zirconia Anodes
Soo-Man Sim
J. Korean Ceram. Soc. 2018;55(4):376-380. Published online July 24, 2018 DOI: https://doi.org/10.4191/kcers.2018.55.4.10
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Engineering Ceramics |
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Characteristics of Carbon Tetrafluoride Plasma Resistance of Various Glasses
Jae Ho Choi, Yoon Soo Han, Sung Min Lee, Hyung Bin Park, Sung Churl Choi, Hyeong Jun Kim
J. Korean Ceram. Soc. 2016;53(6):700-706. Published online November 30, 2016 DOI: https://doi.org/10.4191/kcers.2016.53.6.700
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A Surface Etching for Synthetic Diamonds with Nano-Thick Ni Films and Low Temperature Annealing
Jeongho Song, Yunyoung Noh, Ohsung Song
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Fabrication and Mechanical Properties of High-strength Porous Supports for High Temperature Oxygen Transport Membrane
Geum Sook Park, Young-Hoon Seong, Ji Haeng Yu, Sang Kuk Woo, Moon Hee Han
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Variation of the Nanostructural and Optical Features of Porous Silicon with pH Conditions
Hyo-Han Kim, Nam-Hee Cho
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Effect of HF Treatment on the Crystallization Behavior of the Glass Containing Coal Bottom Ashes
Si-Nae Jo, Seung-Gu Kang
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Optimization of Glass Wafer Dicing Process using Sand Blast
Won Seo, Young-Mo Koo, Jae-Woong Ko, Gu-Sung Kim
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Dissolution Phenomenon in BaO-B2O3-ZnO Glass System by Acid Etching
Jae-Myung Kim, Kyung-Jun Hong, Nam-Suk Kim, Hyung-Sun Kim
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Congruent LiNbO3 Crystal Periodically Poled by Applying External Field
Soon-Woo Kwon, Woo-Seok Yang, Hyung-Man Lee, Woo-Kyung Kim, Han-Young Lee, Dae-Ho Yoon, Yo-Seung Song
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Fabrication of a (100) Silicon Master Using Anisotropic Wet Etching for Embossing
Yu-Min Jung, Yeong-Cheol Kim
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Dependence of the Diamond Coating Adhesion on the Microstructure of WC-Co Substrates
Dong-Beum Lee, Ki-Woong Chae
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Sulfuric Acid Treatment of Sapphire Substrates for Growth of High-Quality Epilayers
Ji-Won Park, Young-Soo No, Yeon-Sik Jung, Seok-Jin Yoon, Tae-Whan Kim, Won-Kook Park
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Surface Morphology and Characteristics of LiNbO3 Single Crystal by Helicon Wave Plasma Etching
박우정, 양우석, 이한영, 윤대호
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Characterization of Deep Dry Etching of Silicon Single Crystal by HDP
박우정, 김장현, 김용탁, 백형기, 서수정, 윤대호
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Generation of Low Temperature Plasma at Atmospheric Pressure and its Application to Si Etching in Open Air
Bong-Ju Lee
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Structural and Optical Properties of Porous Silicon Prepared by Electrochemical Etching
Jeong-Seok Lee, Nam-Hee Cho
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Fabrication of Er-doped Sodium Borosilicate Glass Films Using Aerosol Flame Deposition Method
문종하, 정형곤, 이정우, 박강희, 박현수, 김병훈
J. Korean Ceram. Soc. 2000;37(2):117
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Etching Characteristics of Er-doped Sodium Borosilicate Glass Film Fabricated by Aerosol Flame Deposition Method
박강희, 정형곤, 이정우, 이형종, 박현수, 문종하
J. Korean Ceram. Soc. 1999;36(9):946
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Selectivity and Characteristics of $beta$-SiC Thin Film Deposited on the Masked Substrate
양원재, 김성진, 정용선, 최덕균, 전형탁, 오근호
J. Korean Ceram. Soc. 1999;36(1):55
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The Improvement of Surface Roughness of Poly-$Si_{1-x}Ge_x$Thin Film Using Ar Plasma Treatment
이승호, 소명기
J. Korean Ceram. Soc. 1997;34(11):1121
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Anisotropic Silicon Etching Using $RuO_2$ Thin Film as a Mask Layer by TMAH Solution
이재복, 오세훈, 홍경일, 최덕균
J. Korean Ceram. Soc. 1997;34(10):1021
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