Effects of the Post-annealing of Insulator on the Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor Structure

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J. Korean Ceram. Soc. > Volume 37(11); 2000 > Article

Journal of the Korean Ceramic Society 2000;37(11): 1051.

절연막이 후 열처리가 Metal/Ferroelectric/Insulator/Semiconductor 구조의 전기적 특성에 미치는 영향

원동진, 왕채현, 최두진

연세대학교 공과대학 세라믹공학과

Effects of the Post-annealing of Insulator on the Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor Structure

Key words: MFIS(Metal/Ferroelectric/Insulator/Semiconductor), Post annealing, Interfacial layer, $PbTiO_3$, $CeO_2$, $TiO_2$

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