Fabrication of <TEX>$PbTiO_3$</TEX> Thin Film by Chemical Vapor Deposition Technique

,; ,; ,; ,

J. Korean Ceram. Soc. > Volume 23(6); 1986 > Article

Journal of the Korean Ceramic Society 1986;23(6): 33.

화학증착법에 의한 $PbTiO_3$ 박막의 재료

윤순길, 김호기

한국과학기술원 재료공학과

Fabrication of $PbTiO_3$ Thin Film by Chemical Vapor Deposition Technique

ABSTRACT

The $PbTiO_3$is well known materials having remarkable ferroelectric piezoelectric and pyro-electric properties. Thin films of the lead titanite has been successfully fabricated by Chemical Vapor Deposition on the borosilicate glass and titanium substrate. The $PbTiO_3$ thin film deposited on the borosilicate glass using the $PbCl_2$, $TiCl_4$ dry oxygen and wet oxygen at different temperatures (50$0^{circ}C$-$700^{circ}C$) grows along the (001) preferred orientation. On the other hand the $PbTiO_3$ thin film deposited on the titanium substrate using the PbO grows along the (101) preferred orientation. Growth orientation of deposited $PbTiO_3$ depends on the reaction species irrespective of substrate materials. Maximum dielectic constant and loss tangent of the $PbTiO_3$ thin film deposited on the titanium substrate are about 90 and 0.02 respectively, . Deposition rates of $PbTiO_3$ deposited on the borosilicate glass and titanium substrate are 10-15 ${mu}{textrm}{m}$/hr. Titanium dioxide interlayer formed be-tween $PbTiO_3$ film and titanium substrate material, It improved the adhesion of the film.