| 플라즈마 토치와 전자빔을 이용한 금속급 실리콘 정제 |
| 음정현, 남산1, 황광택, 김경자, 최균 |
한국세라믹기술원 이천분원
1고려대학교 신소재공학과 |
| Purification of Metallurgical Grade Silicon by Plasma Torch and E-beam Treatment |
| Jung-Hyun Eum, Sahn Nahm1, Kwang-Taek Hwang, Kyung-Ja Kim, Kyoon Choi |
Icheon Branch, KICET
1Division of Material Science and Engineering, Korea University |
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| ABSTRACT |
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Cost-effective purification methods of silicon were carried out in order to replace the conventional Siemens method for solar grade silicon. Firstly, acid leaching which is a hydrometallurgical process was preceded with grinded silicon powders of metallurgical grade (~99% purity) to remove metallic impurities. Then, plasma treatments were performed with the leached silicon powders of 99.94% purity by argon plasma at 30 kW power under atmospheric pressure. Plasma treatment was specifically efficient for removing Zr, Y, and P but not for Al and B. Another purification step by EB treatment was also studied for the 99.92% silicon lump which resulted in the fast removal of boron and aluminum. That means the two methods are effective alternative tools for removing the doping elements like boron and phosphor. |
| Key words:
Solar grade silicon, Metallurgical grade silicon, Purification, Plasma treatment, Electron-beam treatment |
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